Paper

1. “Synthesis and Structural/Physical Properties of Well-Defined Linear and Star-Shaped Polysulfides Constructed by Controlled Insertion Reaction of Thiirane and Carbamic Acid Thioester” Ryota Tsutsui, Akiyuki Ryoki, Hiroaki Uchiyama, and Hiroto Kudo* Macromolecules, Articles ASAP (Article) DOI: 10.1021/acs.macromol.5c00653.
2. “Star-Shaped Polymers with Helical Polyacetylene Arms. Comparison of Solution- and Solid-State Properties with Linear Helical Polyacetylenes” Shota Mino, Kosuke Matsui, Masahide Goto, Akiyuki Ryoki, Takeyuki Suzuki, Kazushi Fujimoto, Hiromitsu Sogawa, Hiroto Kudo, and Fumio Sanda* Macromolecules 2024, 57, 22, 10824-10834.
3. “UV-Curable High-Refractive-Index Resin Based on Polysulfide With Pendant Methacrylate Formed by Selective Cationic Ring-Opening Polymerization of Thiirane” Hiroto Kudo, Koichi Hirose, Ryota Tsutsui, Hiroyuki Maekawa, Hiroaki Uchiyama, Journal of Polymer Science 2025, 63 (9), 2055–2063.
4. “Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity” Riku Akabane1, Kazumasa Okamoto, Takahiro Kozawa, and Hiroto Kudo*, Journal of Photopolymer Science and Technology (2024), 37(3), 293–298.
5. “Synthesis of Resist Materials Containing Hemiacetal Groups and Their Resist Sensitivity” Kouta Iwane1, Hiroto Kudo*, Kazumasa Okamoto2, and Takahiro Kozawa2 Journal of Photopolymer Science and Technology (2024), 37(3), 287–292.
6. “Synthesis and properties of highly thermally stable ultrathin films of fluorine-containing hyperbranched polybenzoxazoles” Hiroyuki Maekawa, Koshu Nakamura, Hiroto Kudo*, Journal of Polymer Science (2024), 62(9), 1731-1741.
7. “Design of high-sensitive resist materials based on polyacetals” Hiroyuki Maekawa, Yutaro Iwashige, Hiroaki Yamamoto, Kazumasa Okamoto,Kazumasa； Takahiro Kozawa, Hiroto Kudo*, Journal of Photopolymer Science and Technology (2023), 36(1), 31-39.
8. “Calixarene-based Cage Compound: Synthesis via Simple Condensation of t-Butylcalix[4]arene with α,ω-Dibromoacetate and Inclusion Complex Formation with Phenol” Hiroyuki Maekawa, Tatsuo Yajima, Hiroto Kudo*, Chemistry Letters 52(12), 883–886 (2023).
9. “Development of selective separation and recovery process of Au(III) using Noria” Manabu Ueda, Yuki Ishida, Mitsuaki Matsuoka, Hirokazu Narita, Hiroto Kudo, Norihiro Murayama, Kagaku Kogaku Ronbunshu (2023), 49(2), 38-44.
10. “Synthesis and resist sensitive property of iodine-containing materials using extreme ultraviolet (EUV) exposure tool” Yutaro Iwashige, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa, Journal of Photopolymer Science and Technology (2022), 35(1), 41-47.
11. “Synthesis and Properties of High-Refractive-Index Iodine-Containing Polyacrylates” Hiroyuki Maekawa, Hikaru Amano, Ikuko Nishina, Hiroto Kudo, Chemistry Select (2022), 7(28), e202201543
12. “Development of refractive-in dices materials for optical switching devices” Hirot Kudo*, Nettowaku Porima Ronbunshu (2022), 43(1), 14-21.
13. “Thermosetting epoxy resin system: Ring-opening by copolymerization of epoxide with D,L-Lactide” Hiroto Kudo, Shuji Nishioka, Huayi Jin, Hiroyuki Maekawa, Shinya Nakamura, Tomoya Masuda, Polymer (2022), 240, 124489.
14. “Non-chemically amplified negative molecular resist materials using polarity change by EUV exposure” Kohei Fujisawa, Hiroyuki Maekawa, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa, Journal of Photopolymer Science and Technology (2021), 34(1), 87-93.
15. “Programmed Dynamic Covalent Chemistry System of Addition-condensation Reaction of Phenols and Aldehydes” Hiroto Kudo, Daisuke Shimoyama, Ryo Sekiya, Takeharu Haino, Chemistry Letters (2021), 50(4), 825-831.
16. “Synthesis and metal-complexation ability of crosslinked materials containing noria-templated cavities with pendant hydroxy group” Hiroto Kudo, Tsubasa Miyamae, Masato Ueda, Norihiro Murayama, Jun-ichi Hayashi, Nettowaku Porima Ronbunshu (2020), 41(2), 65-71
17. “Higher sensitive extreme ultraviolet (EUV) resist materials derived from p-t-butylcalix[n]arenes (n = 4 and 8)” Hiroyuki Maekawa, Hiroto Kudo, Takeo Watanabe, Hiroki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa, Journal of Photopolymer Science and Technology (2020), 33(1), 45-51.
18. “One-dimensional arrangement of NORIA in the solid-state” Daisuke Shimoyama, Ryo Sekiya, Hiroyuki Maekawa, Hiroto Kudo, Takeharu Haino, CrystEngComm (2020), 22(28), 4740-4747.
19. “Living Ring-Expansion Polymerization of Thiirane with Cyclic Monocarbamothioates” Hiroto Kudo, Kazunori Naritomi, Shuto Onishi, Hiroyuki Maekawa, Evan A. Q. Mondarte, Kasinan Suthiwanich, Tomohiro Hayashi, Macromolecules (Washington, DC, United States) (2020), 53(12), 4733-4740.

Patent

1. “Tellurium-containing polymer and compound” Kansai University; Mitsubishi Gas Chemical Company, Inc. World Intellectual Property Organization, WO2023214589 A1 2023-11-09
2. “Optical material, optical component and optical article having high refractive index” Kansai University, JP2022131503 A 2022-09-07
3. “Intramolecularly crosslinked calixarene compound, production method therefor, composition, resist film, and pattern formation method” Kansai University; Mitsubishi Gas Chemical Company, Inc. World Intellectual Property Organization, WO2021230185 A1 2021-11-18.
4. “Preparation of bisphenol or trisphenol ether containing phenylsulfonium salts, production method therefor, acid generators, resist compositions, resist films, underlayer films, pattern formation method, and optical components” Kansai University; Mitsubishi Gas Chemical Company, Inc. World Intellectual Property Organization, WO2021230184 A1 2021-11-18
5. “High-refractive-index iodine-containing polymer having excellent solubility, film-forming property, heat resistance and transparency”Kansai University; JP2021084981 A 2021-06-03
6. “Method for recovering gold, gold recovery agent and gold recovery apparatus”　Kansai University; National Institute of Advanced Industrial Science and Technology, Japan, JP2021080511 A 2021-05-27
7. “Compound, resin, composition, resist film, pattern forming method, underlayer film, and optical article” Kansai University; Mitsubishi Gas Chemical Company, Inc. World Intellectual Property Organization, WO2021049472 A1 2021-03-18
8. “Compound and production method thereof, resin, composition, resist film, pattern forming method, underlayer film for lithography, optical component, and method for purifying compound or resin” Kansai University; Mitsubishi Gas Chemical Company, Inc. World Intellectual Property Organization, WO2020226150 A1 2020-11-12
9. “Epoxy resin composition, cured product with good heat resistance for electronic parts and manufacturing method thereof” Hitachi Chemical Company, Ltd.; Kansai University; Resonac Co., Ltd.; Japan, JP2020172607 A 2020-10-22
10. “Resin composition and cured product having good heat resistance for electronic apparatus parts” Hitachi Chemical Company, Ltd.; Kansai University Japan, JP2020172608 A 2020-10-22.
11. “Epoxy resin composition for preparing an epoxy resin cured product with excellent heat resistance and an epoxy resin modifier therefor” Hitachi Chemical Company, Ltd.; Kansai University; Resonac Co., Ltd.; , Kansai University

Review

1. “Development of new resist materials” Maekawa, Hiroyuki; Kudo, Hiroto,